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New from Hiden Analytical
Vacuum News
New from Caburn-MDC STC deposition rate controller. The STC-200 thickness rate
New from TopoMetrix Powerful n e w atomic force microscope at breakthrough price.
controller is an advanced film thickness and rate control instrument for Lse in the vacuum deposition of thin films. The STC-200 controls a wide variety of thermal and sputtering deposition sources. This unit ~tilizes the extremely sensitive and time proven 6 MHz quartz crystal as the sensor device. An advanced microprocessor allows the direct solution of the complex equations for mass to thickness conversion ; t~is eliminates inaccuracies due to approximations and provides a cegree of measurement precision and accuracy not previously available.
TopoMetrix Corporation, Santa Clara, CA introduce the TMX 1000 Explorer AFM system at the Electron Microscopy Society of America meeting in Boston, MA. This complete atomic force microscope (AFM) system provides capability that meets or exceeds all other available AFM instruments at an introductory price of $59,950 in the United States, significantly less than any other full AFM instrument previously offered.
"rhe STC-200's data display is a highly readable 114 mm CRT. Along with a full keypad for data entry and the use of windows and menus, tt~e operator has quick and direct access to all important process information and status. The STC-200 has one active film program with capability to store up to eight alternative film programs. A long list of standard items makes the STC-200 the most cost-effective deposition process controller available. These standard features include: eight high current relay outputs, eight remote input lines, analogue recorder output, and a hand controller for manual power control operation. A serial RS-232 computer interface is also provided which sJpports two protocols, including the SEMI SECS II standard.
The TMX 1000 Explorer may be placed directly on the sample to be analyzed, allowing AFM imaging of samples of any size. It can be used to image samples in air or while submerged in liquids. Ease of operation is provided by an optical microscope with 200x magnification, for viewing of the probe and sample, and by computer controlled probe approach, allowing the tip to be automatically moved into imaging position. The system can be used for scans from atomic resolution to areas as large as 150 x 150 microns. Further information from : Gary Aden 1505 Wyatt Drive Santa Clara CA 95065, USA Tel 408 982 9700 Fax 408 982 9751
Further information from : Caburn-MDC Ltd The Street Glynde East Sussex BN8 6 SJ, UK Tel 0273 858585 Fax 0273 858561
New from Hiden Analytical The Hiden A n a l y t i c a l IPA s y s t e m f o r process c o n t r o l and analysis o f gas r e a c t i o n s . The Hiden Analytical IPA system is a
New from Granville-Phillips Co N e w vacuum gauge aids troubleshooting. The new MiniConvectron TM is an atmosphere-1 m torr vacuum pressure gauge for aoplications that do not need front-panel displays and controls. An ir~tegral meter provides local pressure indication for troubleshooting or convenient at-a-glance status. The Mini-Convectron saves space and reduces instrumentation cost for computer controlled vacuum systems. The gauge's fast response helps reduce cycle time delays. Stability and excellent repeatability help reduce product defects and downtime caused by gauges prone to calibration drift.
N e w gauge control simplifies pressure readout. The new 338 vacuum gauge control (VGC) from Granville-Phillips is designed to help increase productivity by reducing potential operator confusion. An unambiguous single display provides direct pressure readout from above atmosphere to 1 x 10 -l° torr using a reliable, field proven Convectron T M thermal conductivity gauge and a hot cathode ionization gauge. In addition to the simplicity of a single readout display, infrequently used controls are housed behind a hinged front panel to reduce front panel clutter. The 3-1/2" high control is available as a space saving half rack or a compact 8" wide bench mount unit. C'oss-over between the t w o gauges is handled automatically by the control. Available options include four channel process control for system automation, and RS-232 and IEEE-488 computer interfaces for remote operation. Further information from : Lisa A Whitten Granville-Phillips Co 5675 Arapohoe Ave Boulder CO 80303, USA Tel 303 443 7660 Fax 303 443 2546
IPA system from Hiden Analytical. 633
Vacuum News modular instrument for precise control of gas pressure, temperature, flow rate and composition (up to four reactants) and for analysis of the gas composition by dynamic sampling mass spectrometry. The system operates from high vacuum (10 -6 mbar) to 20 bars and at temperatures up to 1 000°C and can be connected to user reactors or supplied with reactors and gas-handling to custom designs. The I PA software provides fully automatic operation for many types of experiment, including thermal desorption, pressure-temperature cycling, reaction reduction cycling and gas composition switching. Applications include the study of gas separation, gas purification, physisorption, chemisorption and catalysis. The system is mobile and may be used for varying experiments within the laboratory.
HPR30 process gas analysis system. Hiden Analytical are pleased to announce the new HPR30 process gas analysis system. The HPR30 is a complete gas analysis system with high performance HAL Series II quadrupole mass spectrometer, differentially pumped housing and a specially designed contamination resistant orifice inlet. The instrument bolts directly to the process chamber with the sampling orifice inserted into the process gas; this insures that measurements accurately represent the gas composition and that there is a fast response to changes in the process conditions. It is particularly suitable for vacuum process monitoring, since it can detect process contaminants and reaction products at parts per billion concentrations. The H PR30 system is configurable with pneumatic valve operation, providing automatic sampling and complete protection against process venting or vacuum failure. HAL MIDAS software allows data to be presented as a concentration in any given process gas. Results may be stored to disc for process quality control records.
Ion milling probe from Hiden Analytical.
Ion d e s o r p t i o n p r o b e . The HAL IDP probe is a quadrupole mass spectrometer system configured with ion extraction optics and an ion counter (range 1 107 c s 1). It is suitable for the detection of low energy positive and negative ions generated from uhv surface science techniques such as ESD (electron stimulated desorption) and PSD (photon stimulated desorption). It may also be used for thermal desorption studies where neutral species may be analysed by post ionization. Ion energy distributions (lED's) are determined by retarding field techniques, and TTL or ECL outputs with input pulse gating allow time of flight (TOF) measurements.
HPR30 process gas analysis system. ii~ Ion m i l l i n g p r o b e . The HAL IMP is a quadrupole mass spectrometer with ion optics and integral energy filter for direct analysis of secondary ions from the etch process. The secondary ions provide very precise information about the substrate surface composition.
Ion desorption probe from Hiden Analytical.
Further information from : Etching depth in ion beam etching (IBE) or reactive ion beam etching (RIBE) can be controlled to within 10 ~k using the HAL IMP. End points can easily be detected even at depths of greater than 5000 ~. The technique is multi-elemental and applicable to many applications, including etching of VLSI device structures, superconducting thin films and magnetic disc sensor heads. 634
Hiden Analytical Ltd 231 Europa Boulevard Gemini Business Park Warrington WA5 5TN, UK Tel (0925) 445225 Fax (0925) 416518
New from Caburn-MDC STC deposition rate controller. The STC-200 thickness rate
New from TopoMetrix Powerful n e w atomic force microscope at breakthrough price.
controller is an advanced film thickness and rate control instrument for Lse in the vacuum deposition of thin films. The STC-200 controls a wide variety of thermal and sputtering deposition sources. This unit ~tilizes the extremely sensitive and time proven 6 MHz quartz crystal as the sensor device. An advanced microprocessor allows the direct solution of the complex equations for mass to thickness conversion ; t~is eliminates inaccuracies due to approximations and provides a cegree of measurement precision and accuracy not previously available.
TopoMetrix Corporation, Santa Clara, CA introduce the TMX 1000 Explorer AFM system at the Electron Microscopy Society of America meeting in Boston, MA. This complete atomic force microscope (AFM) system provides capability that meets or exceeds all other available AFM instruments at an introductory price of $59,950 in the United States, significantly less than any other full AFM instrument previously offered.
"rhe STC-200's data display is a highly readable 114 mm CRT. Along with a full keypad for data entry and the use of windows and menus, tt~e operator has quick and direct access to all important process information and status. The STC-200 has one active film program with capability to store up to eight alternative film programs. A long list of standard items makes the STC-200 the most cost-effective deposition process controller available. These standard features include: eight high current relay outputs, eight remote input lines, analogue recorder output, and a hand controller for manual power control operation. A serial RS-232 computer interface is also provided which sJpports two protocols, including the SEMI SECS II standard.
The TMX 1000 Explorer may be placed directly on the sample to be analyzed, allowing AFM imaging of samples of any size. It can be used to image samples in air or while submerged in liquids. Ease of operation is provided by an optical microscope with 200x magnification, for viewing of the probe and sample, and by computer controlled probe approach, allowing the tip to be automatically moved into imaging position. The system can be used for scans from atomic resolution to areas as large as 150 x 150 microns. Further information from : Gary Aden 1505 Wyatt Drive Santa Clara CA 95065, USA Tel 408 982 9700 Fax 408 982 9751
Further information from : Caburn-MDC Ltd The Street Glynde East Sussex BN8 6 SJ, UK Tel 0273 858585 Fax 0273 858561
New from Hiden Analytical The Hiden A n a l y t i c a l IPA s y s t e m f o r process c o n t r o l and analysis o f gas r e a c t i o n s . The Hiden Analytical IPA system is a
New from Granville-Phillips Co N e w vacuum gauge aids troubleshooting. The new MiniConvectron TM is an atmosphere-1 m torr vacuum pressure gauge for aoplications that do not need front-panel displays and controls. An ir~tegral meter provides local pressure indication for troubleshooting or convenient at-a-glance status. The Mini-Convectron saves space and reduces instrumentation cost for computer controlled vacuum systems. The gauge's fast response helps reduce cycle time delays. Stability and excellent repeatability help reduce product defects and downtime caused by gauges prone to calibration drift.
N e w gauge control simplifies pressure readout. The new 338 vacuum gauge control (VGC) from Granville-Phillips is designed to help increase productivity by reducing potential operator confusion. An unambiguous single display provides direct pressure readout from above atmosphere to 1 x 10 -l° torr using a reliable, field proven Convectron T M thermal conductivity gauge and a hot cathode ionization gauge. In addition to the simplicity of a single readout display, infrequently used controls are housed behind a hinged front panel to reduce front panel clutter. The 3-1/2" high control is available as a space saving half rack or a compact 8" wide bench mount unit. C'oss-over between the t w o gauges is handled automatically by the control. Available options include four channel process control for system automation, and RS-232 and IEEE-488 computer interfaces for remote operation. Further information from : Lisa A Whitten Granville-Phillips Co 5675 Arapohoe Ave Boulder CO 80303, USA Tel 303 443 7660 Fax 303 443 2546
IPA system from Hiden Analytical. 633
Vacuum News modular instrument for precise control of gas pressure, temperature, flow rate and composition (up to four reactants) and for analysis of the gas composition by dynamic sampling mass spectrometry. The system operates from high vacuum (10 -6 mbar) to 20 bars and at temperatures up to 1 000°C and can be connected to user reactors or supplied with reactors and gas-handling to custom designs. The I PA software provides fully automatic operation for many types of experiment, including thermal desorption, pressure-temperature cycling, reaction reduction cycling and gas composition switching. Applications include the study of gas separation, gas purification, physisorption, chemisorption and catalysis. The system is mobile and may be used for varying experiments within the laboratory.
HPR30 process gas analysis system. Hiden Analytical are pleased to announce the new HPR30 process gas analysis system. The HPR30 is a complete gas analysis system with high performance HAL Series II quadrupole mass spectrometer, differentially pumped housing and a specially designed contamination resistant orifice inlet. The instrument bolts directly to the process chamber with the sampling orifice inserted into the process gas; this insures that measurements accurately represent the gas composition and that there is a fast response to changes in the process conditions. It is particularly suitable for vacuum process monitoring, since it can detect process contaminants and reaction products at parts per billion concentrations. The H PR30 system is configurable with pneumatic valve operation, providing automatic sampling and complete protection against process venting or vacuum failure. HAL MIDAS software allows data to be presented as a concentration in any given process gas. Results may be stored to disc for process quality control records.
Ion milling probe from Hiden Analytical.
Ion d e s o r p t i o n p r o b e . The HAL IDP probe is a quadrupole mass spectrometer system configured with ion extraction optics and an ion counter (range 1 107 c s 1). It is suitable for the detection of low energy positive and negative ions generated from uhv surface science techniques such as ESD (electron stimulated desorption) and PSD (photon stimulated desorption). It may also be used for thermal desorption studies where neutral species may be analysed by post ionization. Ion energy distributions (lED's) are determined by retarding field techniques, and TTL or ECL outputs with input pulse gating allow time of flight (TOF) measurements.
HPR30 process gas analysis system. ii~ Ion m i l l i n g p r o b e . The HAL IMP is a quadrupole mass spectrometer with ion optics and integral energy filter for direct analysis of secondary ions from the etch process. The secondary ions provide very precise information about the substrate surface composition.
Ion desorption probe from Hiden Analytical.
Further information from : Etching depth in ion beam etching (IBE) or reactive ion beam etching (RIBE) can be controlled to within 10 ~k using the HAL IMP. End points can easily be detected even at depths of greater than 5000 ~. The technique is multi-elemental and applicable to many applications, including etching of VLSI device structures, superconducting thin films and magnetic disc sensor heads. 634
Hiden Analytical Ltd 231 Europa Boulevard Gemini Business Park Warrington WA5 5TN, UK Tel (0925) 445225 Fax (0925) 416518