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News from atom tech UK
Vacuum News Services" fleet provides nationwide coverage and fast response times to meet the requirements of site owners and operators. Further information from: Mr Barry Dewhurst Fulham House Goldsmith Road Woking Surrey GU21 1LZ Tel 0483 770143 Fax 0483 769335
News from Atom Tech UK Atom Tech UK, formerly Ion Tech Ltd, supplier of magnetron sputtering sources and equipment, ion beam etch/thinning/deposition systems and filamentless saddle field ion and fast atom beam sources, has restructured its sales organization to provide a higher degree of technical support and has appointed Dr Peter J Revell Sales Manager, located in the UK. Peter brings more than 15 years of experience in the semiconductor industry and general management as well as research, product development and operations. Prior to joining Atom Tech, Peter spent several years at the former Ion Tech as a Technical Manager where he managed the company's research and development department. Multi-image view of the VacuTect probe.
It is unaffected by factors such as temperature changes, vapour pockets, pressure, vibration or equipment calibration accuracy, which can cause false readings with alternative methods. Water ingress, a problem for volumetric methods, is positively identified and measured using VacuTect. As VacuTect is a precision method, results are accurate and reliable. The complete test system is housed in a purpose built vehicle which is fully equipped for single or dual tank testing. The PM Precision Testing
With a strong management team in place, the task of continuing to build on Atom Tech's success, while also tackling new challenges becomes attainable. Peter is a major part of our strategic plan to meet those goals. Further information from: Atom Tech Ltd Island Farm Avenue West Motesey Surrey KT8 2UZ Tel 081 941 8959 Fax 081 941 8948
New literature N e w l i t e r a t u r e f r o m M RS Thin films: Stresses and Mechanical P r o p e r t i e s - - 3 . The third in a series, this book is a useful reference volume on stresses and mechanical properties of thin films, for those who have been working in the field as well as those who are new to the field. Among topics discussed are microstructural processes and intrinsic stresses; stresses and deformation processes; mechanical testing techniques and mechanical properties; indentation: modelling and experiments; strain relaxation and misfit dislocations in heteroepitaxial thin films; multilayers: stresses and mechanical properties; and adhesion and fracture properties of thin films. The editors are William D Nix (Stanford University), John C Bravrnan (Stanford University), Eduard Arzt (Max-Planck-lnstitute fi3r Metallforschung) and L Ben Freund (Brown University). Prices are $47.00 (MRS Members), S53.00 (US List), and $68.00 (Foreign List).
Interface Dynamics and Growth. This publication documents a symposium held at the 1991 MRS Fall Meeting in Boston, Massachusetts. It addresses the topics of interface motion, roughening, 410
wetting, and faceting; growth kinetics and morphology; step flow and microstructure evolution in film growth; self-assembled organic monolayers and electrochemical interfaces; advanced surface imaging and scattering techniques; surfactant, buffer, and step assisted epitaxy; epitaxial semiconductor films; and thin film formation and stability. Edited by Keng S Liang (Exxon Research & Engineering Company), Michael P Anderson (Exxon Research & Engineering Company), Robijn F Bruinsma (University of California, Los Angeles), and Giancinto Scoles (Princeton University), Interface Dynamics and Growth [ISBN: 1-55899-131 -X] is Vol 237 in the MRS Symposium Proceedings Series. It contains 98 papers (689 pages) and is available in hardcover or microfiche for $44.00 (MRS Members), $50.00 (US List), and $65.00 (Foreign List).
Ion-assisted Processing of Electronic M a t e r i a l s . Ion beams are routinely used to define electrical pathways in semiconductors. New techniques using ion beams alone or combined with other deposition methods are always arising--making it possible to fabricate smaller, high-quality structures. Understanding just how energetic ions interact
News from Atom Tech UK Atom Tech UK, formerly Ion Tech Ltd, supplier of magnetron sputtering sources and equipment, ion beam etch/thinning/deposition systems and filamentless saddle field ion and fast atom beam sources, has restructured its sales organization to provide a higher degree of technical support and has appointed Dr Peter J Revell Sales Manager, located in the UK. Peter brings more than 15 years of experience in the semiconductor industry and general management as well as research, product development and operations. Prior to joining Atom Tech, Peter spent several years at the former Ion Tech as a Technical Manager where he managed the company's research and development department. Multi-image view of the VacuTect probe.
It is unaffected by factors such as temperature changes, vapour pockets, pressure, vibration or equipment calibration accuracy, which can cause false readings with alternative methods. Water ingress, a problem for volumetric methods, is positively identified and measured using VacuTect. As VacuTect is a precision method, results are accurate and reliable. The complete test system is housed in a purpose built vehicle which is fully equipped for single or dual tank testing. The PM Precision Testing
With a strong management team in place, the task of continuing to build on Atom Tech's success, while also tackling new challenges becomes attainable. Peter is a major part of our strategic plan to meet those goals. Further information from: Atom Tech Ltd Island Farm Avenue West Motesey Surrey KT8 2UZ Tel 081 941 8959 Fax 081 941 8948
New literature N e w l i t e r a t u r e f r o m M RS Thin films: Stresses and Mechanical P r o p e r t i e s - - 3 . The third in a series, this book is a useful reference volume on stresses and mechanical properties of thin films, for those who have been working in the field as well as those who are new to the field. Among topics discussed are microstructural processes and intrinsic stresses; stresses and deformation processes; mechanical testing techniques and mechanical properties; indentation: modelling and experiments; strain relaxation and misfit dislocations in heteroepitaxial thin films; multilayers: stresses and mechanical properties; and adhesion and fracture properties of thin films. The editors are William D Nix (Stanford University), John C Bravrnan (Stanford University), Eduard Arzt (Max-Planck-lnstitute fi3r Metallforschung) and L Ben Freund (Brown University). Prices are $47.00 (MRS Members), S53.00 (US List), and $68.00 (Foreign List).
Interface Dynamics and Growth. This publication documents a symposium held at the 1991 MRS Fall Meeting in Boston, Massachusetts. It addresses the topics of interface motion, roughening, 410
wetting, and faceting; growth kinetics and morphology; step flow and microstructure evolution in film growth; self-assembled organic monolayers and electrochemical interfaces; advanced surface imaging and scattering techniques; surfactant, buffer, and step assisted epitaxy; epitaxial semiconductor films; and thin film formation and stability. Edited by Keng S Liang (Exxon Research & Engineering Company), Michael P Anderson (Exxon Research & Engineering Company), Robijn F Bruinsma (University of California, Los Angeles), and Giancinto Scoles (Princeton University), Interface Dynamics and Growth [ISBN: 1-55899-131 -X] is Vol 237 in the MRS Symposium Proceedings Series. It contains 98 papers (689 pages) and is available in hardcover or microfiche for $44.00 (MRS Members), $50.00 (US List), and $65.00 (Foreign List).
Ion-assisted Processing of Electronic M a t e r i a l s . Ion beams are routinely used to define electrical pathways in semiconductors. New techniques using ion beams alone or combined with other deposition methods are always arising--making it possible to fabricate smaller, high-quality structures. Understanding just how energetic ions interact