Reducing defects in arc vapor deposition

ting passage of fluid or debris through the abrasive article during grinding.

U.S. Patent 5,738,730.Apr. 14, 1998

Device for Electrostatic Spraying

H. Jojo et al., assignors KK, Tokyo

U.S. Patent 5,738,727. Apr. 14, 1998 D. Cebola et al, assignors to Sames S.A., France

An electrostatic device for spraying a coating product onto an object, comprising at least one sprayer having electrostatic charging means supplying a high voltage of a first polarity and potential for electroslstically charging the coating product: a rnt IVable support structure: components carried by the movable support structure for feeding coating product to the at least one sprayer: an electrostatic shield; and me:ms for maintaining the electrostatic shield.

Vacuum

Coating

ing a negative bias voltage to the wire mesh; depositing coating on the substrate; and entrapping the positively charged coating macroparticles on the negatively charged wire mesh.

Process for Peeling Off Temporarily Protecting Coating Film

Chamber

U.S. Patent 5738,729. Apr. 14, 1998 M. Dubs, assignor to Balzen AG, Furstentum, Liechtenstein

A coating chamber for at least one ,nitially flat platelike substrate comprising an evaporation source and a substrate carrier spaced from the evaporation source.

to Honda Giken Kogyo

A process for peeling off temporarily protecting coating films comprising jetting high-pressure water between the coating surface and end edges of the coating films to peel off the end edges and jetting the high-pressure water sequentially between the coating surface and peeled-off portions to peel off the entire temporarily protecting coating films from the coating surface.

Reducing Defects Deposition

in Arc Vapor

U.S. Pafenf 5,738,768.Apr. 14, 1998 CC?.Dam and L.M. VanLanen. assignors to Caterpillar Inc., Peoria. 111. A process for preventing particle defects in an arc vapor deposition coating on a substrate comprising providing a metallic wire mesh having an opening size; providing a coating material; providing an arc source; positioning the wire mesh in between the arc source and substrate; apply-

C-lzl

Anode

Holder

US Patent 5,738,769. Apr. 14, 7998 R. YK. Chen, Jingalpa, Queensland,Australia

An anode holder for use in electroplating of crank pins comprising two parallel channel chacks defining a channel therebetween. each channel chack having an upper end and a lower end and the channel having an open upper part between the upper ends of the channel chacks; and a ,jaw plate being supported by the lower ends of the channel chacks, and said jaw plate having anodes mounted therein.

Sputtering

Target

US Patent 5,738,770. Apr. 14, 1998 D.P Strauss et al, assignors

to Sony Corp., Tokyo

and Materials Research Corp., Gilbert, Ariz. A target assembly removably mountable in an opening in a wall of a vacuum cham-

ACTIUATOR

paint,

for nickel, silver, chrome, gold, copper, gloss, and ceramics. a..

over Ist

. .

Recommended for use on Wafers and in the Elecronic Circuit Board Industry.

7& E-9

o+ cARBon-=rRoLL

controls, retards, and stabilizes sodium carbonates in any cyanide plating bath.

www.pumachemical.com

Puma Chemical P.O.

Box 67, Warne, NC 28909 Voice: 800 211-7993 Fax: 828 389-4023 Global: 001-828-389-3074

Circle

98

094 on reader

information card

Circle 083 on reader information card

METAL FINISHING . SEPTEMBER 1998