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ScienceDirect Materials Today: Proceedings 2 (2015) 4272 – 4279
nanoFIS 2014 - Functional Integrated nanoSystems
The phonsistor - a novel VO2 based nanoscale thermal-electronic device and its application in thermal-electronic logic circuits (TELC) J. Mizseia,*, M. C. Beina, J. Lappalainenb, L. Juhásza, B. Plesza a
Budapest University of Technology and Economics, Department of Electron Devices, H-1521 Budapest, Hungary b University of Oulu, Department of Electrical Engineering, P.O. Box 4500, FIN-90014, Oulu, Finland
Abstract The continuous development of electronics has been characterized by Moore’s law. Although the current CMOS integrated circuit development is driven by a lot of innovations, there are still some limits determined by unavoidable physical effects. There are many new ideas for building atomic or molecular scale devices for the information technology, but there is still a gap between CMOS technology and novel devices. The recently proposed thermal-electronic device (phonsistor) and the CMOS compatible thermal-electronic logic circuit (TELC) may help to fill this gap. The operation is based on the semiconductor-metal transition (SMT) effect shown by certain materials, for example VO2. The switches can be excited by electronic and thermal signals as well, thus two different physical parameters are available for representing the logic states. A proof of concept for the device operation has been demonstrated, and device scaling and integration issues will be discussed too. 2014 Elsevier All rights reserved. ©Copyright 2015 The © Authors. PublishedLtd. by Elsevier Ltd. This is an open access article under the CC BY-NC-ND license Selection and peer-review under responsibility of Conference Committee of nanoFIS 2014 - Functional Integrated nanoSystems. (http://creativecommons.org/licenses/by-nc-nd/4.0/). Selection and peer-review under responsibility of Conference Committee of nanoFIS 2014 - Functional Integrated nanoSystems. Keywords: nanoelectronics; phonsistor; thermal-electronic; vanadium-dioxide; MIT; SMT
1. Introduction Until now, the continuous development of electronics has been characterized by Moore’s law. The scale down resulted in the nanosized CMOS devices and integrated circuits, pushing the “red brick wall” towards the lower dimensions. Although the current CMOS integrated circuit development is driven by a lot of innovations, there are still some limits determined by unavoidable physical effects such as tunneling of charge carriers through thin
* Corresponding author. Tel.: +36-1-463-2715; fax: +36-1-463-2973. E-mail address:
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2214-7853 © 2015 The Authors. Published by Elsevier Ltd. This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/). Selection and peer-review under responsibility of Conference Committee of nanoFIS 2014 - Functional Integrated nanoSystems. doi:10.1016/j.matpr.2015.09.013
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insulating regions, depletion layers at both side of p-n junctions and statistical irregularities in the number of dopant atoms. On the other hand, there are many new ideas for building atomic or molecular scale devices for the information technology. However, there is still a gap between the up-to-date “top-down” CMOS technology and the “bottom-up” devices, i.e. molecular electronics, nanotubes, single electron transistors. A new functional thermal-electronic device (phonsistor; a portmanteau of “phonon transistor”) and the CMOS compatible thermal-electronic logic circuit (TELC) [1, 2] may help to fill this gap. The operation of these functional devices is based on the semiconductor-metal transition (SMT) effect shown by certain materials, for example VO2. This effect allows an electric resistance change in three to four orders of magnitude induced by thermal or electrical excitation [3]. The phonsistor is made up of only bulk type semiconductor domains, consisting of significantly less regions, interfaces, and providing advanced functionality compared to a monolithic MOSFET (there are no differently doped regions, p-n junctions at all). This way, the single switches can be processed in steps that are technologically less demanding and fewer in number. The switches in the thermal-electronic logic circuit (TELC) can be excited by electronic and thermal signals as well, thus two different physical parameters are available for representing the different logic states. This is similar to neurons in the nervous system, where information is transmitted by different mechanisms for short and long distances and allows the realization of more complex logical connections as well as modeling of data processing in nervous systems. Due to its simple structure and process technology, the TELC can be built as real 3D structure and can be made compatible with current CMOS technology enabling a smooth transition between the two integrated circuit concepts. With its extended logical functionality, TELC represents a higher level of integration that can be achieved with currently available technology. If scaled down to nanosize, the heat is distributed not only by diffusion, as it is characteristic for macroscopic structures. Quantum and hot electron effects enable the device to operate faster than current CMOS switches. 2. The idea of the thermal-electronic logic circuit Most of electron devices are temperature sensitive. The forward voltage of silicon diodes (p-n junctions) decrease about 2 mV/K at a constant forward current. The early idea for thermal-electronic logic circuit (TELC) contained p-n junctions and control resistors (see Fig. 1.). Either of input resistors is heated up, the output voltages decrease (NOR logic function).
Fig. 1. Early idea for thermal-electronic logic circuit (TELC) using p-n junctions and heating resistors
The properties of this kind of thermal-electronic logic circuit depend on thermal properties of the structure and electrical properties of the components. This simple system is not suitable for practical realization of logic networks, as the power gain and the slope of the transfer function is low. However, this may be overcome with devices having different voltage vs. temperature characteristics.
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3. The semiconductor-metal transition Some metal oxides, such as vanadium dioxide (VO2) exhibit reversible temperature-driven phase transition [4] followed by several physical phenomena, including change of optical and electronic properties [5, 8]. From electronic point of view, this is usually mentioned as semiconductor-metal transition (SMT, traditionally mentioned as metalinsulator transition, MIT). Below the transition temperature of 68 °C, VO2 behaves as a semiconductor with monoclinic crystal structure and band gap of about 1 eV, whereas for temperatures higher than 68 °C it transforms abruptly to metallic state with tetragonal rutile structure. In VO2 thin films this transition can be triggered by thermal [5-7], electrical (charge injection or Joule heating) [6-8] or optical excitation (photon excitation) [9, 10], and even by external pressure or strain [10]. The SMT induces extremely fast and abrupt changes in the electronic and optical properties of the material: The electrical resistivity increases by 3 to 5 orders of magnitude (depending on the crystalline quality of the deposited films [12], stoichiometry and doping [12]), while the optical reflectivity markedly decreases [9, 10]. An activation time as short as 100 fs has been reported for the optically driven SMT transition [9, 10], and the electronically induced transition occurs within nanoseconds [6-8, 14]. The SMT resistor itself has thyristor-like characteristics due to the self-heating effect. At certain voltage and current the power dissipation is enough to heat up the system above the phase transition temperature resulting in quick drop of resistance. Thus, the SMT resistor may have two stable operating points, i.e. a high current and low voltage (low resistance metallic) “on” state, and a low current and high voltage (high resistance semiconductor) “off” state (see Fig. 2.).
Fig. 2. Thyristor-like behavior of a physical VO2 bulk resistor in series with a 100 : resistor
4. The phonsistor concept A new thermal-electronic device is planned by integrating a heating resistor and an SMT device. The operation of this device is similar to the bipolar transistor. Joule heat is generated in the heated resistor (see Fig. 3, shaded area). The heat (phonons) is transported towards the SMT resistor by diffusion similar to the diffusion of minority carriers in the base of a bipolar transistor. The switch-on voltage and hold-on current of the SMT resistor can be decreased by temperature increase, controlled by the power dissipated on the attached heating resistor and the thermal properties of the surrounding materials. This thermally coupled device will be hereinafter referred to as phonsistor (patent pending). The operation of devices with characteristic size in the nanometer range could be somewhat different. As the thickness of layer “A” (Fig. 3) is less than the mean free path of electrons, input current flows by ballistic transport resulting in heat-generation at the metal contact and in the SMT resistor material, where hot electrons loose their energy. This effect promises even shorter switching time for the case of scaled-down devices. The phonsistor is a bulk type device, like the bipolar transistor, but it does not contain depletion layers. The number of interfaces is fewer compared to MOS devices and the two terminals of the input can be placed extremely near to
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each other, producing the control heat by tunnel current. Besides the fewer regions, a further benefit compared to a MOS transistor is that phonsistor consists only of near intrinsic regions, thus statistical irregularities caused by the number of dopant atoms are avoided. The SMT effect is demonstrated on 20 nm [15] and 10 nm thin films [16] with 1 ns time constant, therefore the lower limit of scaling down is expected to be about these values.
Fig. 3. The phonsistor concept. (a) The simplest phonsistor consisting of a heating resistor “A” and an SMT resistor “B” thermally coupled. (b) Joule heat of the resistor “A” used for “switching on” the resistor “B” made from SMT material. (c) Scaled-down version (heating resistor thickness lower than the mean free path for electrons) with hot electrons injected directly into the SMT material by ballistic transport and thermalizing there (see shaded domains). Tunnel junction or other type of junctions (p-n, metal-semiconductor) may be used forhot electron injection, too.
5. The SMT-based thermal-electronic logic circuit (TELC) concept Logic gates may be built using one or more heat sources (conventional or SMT resistors) as inputs, thermally coupled with SMT resistors as outputs. This structure shows the following novelties compared to an electronic-only logic gate: x an SMT resistor can be used as input and output as well (bidirectional port); x ports can be connected thermally and/or electrically meaning complex possibilities and also serious challenges in circuit design; x SMT resistors at the input of the gates can “remember” their logic state due to self-heating caused thyristor-like characteristics; x geometry and material selection determines the thermal coupling between the ports enabling relatively simple structures to implement complex logical functions. Some simple logic gates based on the above presented concept can be summarized as follows (see Fig. 4): 1. if the thermal coupling is strong, then any of the “A”-“C” excited phonon emitters produces enough heat to switch on the “O” SMT resistor(s): parallel “OR” logic function; 2. if the thermal coupling is weak, then more than one phonon emitters (“a” and “b”) must be excited in the same time to produce enough heat to switch on the SMT resistor(s): parallel “AND” logic function; 3. complex logic functions can be realized by different thermal coupling between the input resistors and output SMT resistors; 4. if one or more input are excited for shorter time or with lower input signal than the necessary to switch on (subthreshold signal), but these inputs get another subthreshold excitations within the thermal time constant, then the output SMT resistor(s) may switch on: “sequential AND” logic function for a single input, but complex sequential/parallel logic function(s) for two or more inputs.
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Fig. 4. Thermal-electronic logic gates. Each square represents a resistor. “O” resistors are of SMT material, inputs may be SMT or ohmic resistors. The geometry and the thermal conductivity of the applied insulators (effective distance) influence the strength of thermal coupling, thus different logic functions can be realized. (a) OR gate: O=A+B+C; (b) AND gate: O=a×c; (c) Complex AND-OR gate: O=(a×c)+B. Lth represents the thermal diffusion length at the given operating frequency.
The thermal-electric logic circuit (TELC) consists of a lot of phonsistors. Some of them can be thermally coupled to each other (Fig. 5.a), but the output voltage of a voltage-source and pull-up resistor (“P”) powered SMT resistor can be treated as electric signal, too (Fig. 5.b). This electrical signal can be transferred for longer distances through metallic lines.
Fig. 5. Thermal-electric gates with thermal (a) and electrical (b) outputs/propagation lines for electrical and thermal coupling.
The possibility of using two different signals gives high flexibility to this kind of system. Thermal signals, for example, may propagate in different directions, but only for short distances, i.e. about for the thermal diffusion length. However, the thermal signal may propagate and regenerate itself along a longer thermal transmission line (Fig. 5.a) constructed from SMT resistors near to each other. Further input (and output) terminals can be built in along the thermal transmission line (“X”), and the thermally generated logic “one” (the “hot” state) propagates in all directions along the thermal transmission line.
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6. Considerations of physical realization The thermal-electronic logic circuit (TELC) can be realized by thin film technologies compatible with conventional silicon integrated circuits. The proposed vertical arrangement (see cross section on the Fig. 6) includes a substrate (30) with conventional CMOS integrated circuits, and vertical resistors (34-39) embedded into heat and electric insulator (33), together with thermal and/or electrical conductor columns (31-32). The thermally “grounded” (31) heat conductor (copper metallization or a bundle of carbon nanotubes) separates thermally the elements of the system, while the thermally “floating” heat conductor (32) results in good thermal coupling between (36, 38) and (39). If the (38) resistor is an output, than “OR” function is realized for the (36, 37, 39) inputs, while “AND” function is valid for the (34-35) inputs. This kind of arrangement seems to be compatible with metallization technology of VLSI integrated circuits (damascene technology), and it can increase overall function density (as a real 3-dimensional system). However, the vertical and lateral heat and current flow paths should be analysed very precisely.
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31
34
35
37
36
38
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30 Fig. 6. Vertical arrangement for thermal-electric logic circuit (TELC)
As the thermal time constants go down with shrinking of the physical dimensions (scale-down), their value can be comparable with the electrical time constants (10-9-10-10 seconds) if integrated with nanosized “classical” electronics. The thermal-electric logic circuit could be realized separately or together with commercially used silicon VLSI (CMOS) integrated circuits. Electrical and thermal coupling, infrared or visible radiation can be used for interfacing with TELC. The system contains less interfaces, compared to the conventional VLSI circuits, thus the scale down procedure is easier, and more effective. The tunnel effect may limit the scaling down of phonsistor in 10-20 nm linear size and complex logic gates in 50 nm characteristic size. As it has been discussed above, the CMOS compatible TELC could improve the capabilities of the conventional integrated circuits. The TELC could play an important role in the core of microprocessors, as its scaling down
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possibility is one order of magnitude higher, than in the case of CMOS. The most critical, high speed computing jobs may be performed by this thermal-electric logic, while the conventional CMOS part of the chip takes care of timing and connection with the other parts of the complex digital system. 7. Experimental results An experimental model TELC system has been realized by metallization and VO2 thin film deposited by laser ablation onto an insulator substrate. The substrate was cut into chips, which were mounted onto standard TO headers and contacted with wire bonding (Fig. 7.). Outer rings of the metallization were shorted, and used as common ground electrodes. The internal circular areas (dots) serve as inputs and outputs of the circuit. There are 9 thermally coupled devices forming a TELC (see Fig. 7). This arrangement, i.e. the ring shaped electrodes as grounds, helps to separate the electrical control of different gates from each other, as the whole chip is covered with the VO2 layer.
Fig. 7. Thermal electronic logic gate model system mounted onto a TO header, the measuring circuit and the demonstration of OR and AND operation. V1 and V2 are input voltages, V3 is the output signal and V4 is the power (clock) signal.
During testing some of the gates were connected to current limited power supplies through pull up resistors. Gate voltages (1-4) have been monitored and plotted by a four-channel oscilloscope. The gates G1, G2, G3 were used to demonstrate the NOR operation. G3 is treated as output, while G1 and G2 as are inputs. As it can be seen (Fig. 7,
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bottom-left), any of the input gates switches itself and the output on. Simultaneous high state on the gates results in shorter response time. The NAND operation is demonstrated on the very same gates but with shorter heating pulses. Lower supply voltages would result in similar change in behavior. In these cases the power of the Joule-heat produced by one gate alone is not enough to switch on the device (Fig. 7, bottom-right). G3 is only switched on when both of G1 and G2 heats it. After switching on G3 sticks in high state due to self-heating and can only be reset by switching the power supply off (V4 is for clock signal). Note the interaction of input gates: When they’re excited parallel they heat up the output and themselves, too. 8. Conclusion The TELC and its building blocks (phonsistors) are consisting of extremely simple structures (resistors with common bottom electrodes and only two interfaces). They are subject to less physical limiting factors considering the scaling down. Phonsistors are expected to operate down to (at least) 10 nm characteristic linear size. Their realization could be compatible with the recent IC technology. The realization of highly integrated TELC would need very exact and very sophisticated electro-thermal-logic simulation and new design principles to be developed. Successful integration would result in various possibilities of interaction with other part of systems or the ambient (electrical or thermal coupling to CMOS, possibility of optical coupling); improved technological flexibility (horizontal, vertical or mixed realization) and increased design flexibility, due to the reversibility of signal paths and the promise of the implementation of brain-like operation. Acknowledgements The research was partially supported by the project No. NN 110867 of the Hungarian Scientific Research Fund (OTKA). References [1] J. Mizsei, J. Lappalainen, M.C. Bein, “Thermal-electronic integrated logic”, In: Proc. THERMINIC 2013, 25-27 Sep 2013, Berlin, Germany, pp. 344-347. [2] J. Mizsei, J. Lappalainen, Patent WO2013/160709 A2, Oct. 31, 2013. [3] A. Zylbersztejn, N.F. Mott, Phys. Rev. B. 11 (1975) 4383–4395. [4] A. Crunteanu, J. Givernaud, J. Leroy, D. Mardivirin, C. Champeaux, J.C. Orlianges, A. Catherinot, P. Blondy, Sci. Technol. Adv. Mater. 11 (2010) 065002. [5] F.J. Morin, Phys. Rev. Lett. 3 (1959) 34. [6] G. Stefanovich, A. Pergament, D. Stefanovich, Condens. Matter 12 (2000) 8837. [7] H.T. Kim, B.G. Chae, D.H. Youn, S.L. Maeng, G. Kim, K.Y. Kang, Y.S. Lim, New J. Phys. 6 (2004) 52. [8] H.T. Kim, B.J. Kim , S. Choi, B.G. Chae, Y.W. Lee, T. Driscoll, M.M. Qazilbash, D.N. Basov, J. Appl. Phys. 107 (2010) 023702. [9] A. Cavalleri, Cs. Tóth, C.W. Siders, J. A. Squier, F. Ráksi, P. Forget, J. C. Kieffer, Phys. Rev. Lett. 87 (2001) 237401. [10] M. Rini, A. Cavalleri, R.W. Schoenlein, R. López, L.C. Feldman, R.F. Haglund Jr., L.A. Boatner, T.E. Haynes, Opt. Lett. 30 (2005) 558-560. [11] T. Kikuzuki, M. Lippmaa, Appl. Phys. Lett. 96 (2010) 132107. [12] M.B. Sahana, G.N. Subbanna, S.A. Shivashankar, J. Appl. Phys. 92 (2002) 6495. [13] C. Kim, J.S. Shin, H. Ozaki, J. Phys.: Condens.19 (2007) 096007. [14] F. Dumas-Bouchiat, C. Champeaux, A. Catherinot, Crunteanu, P. Blondy, Appl. Phys. Lett. 91 (2007) 223505. [15] J. Nag, R.F. Haglund, J. Phys.: Condens. Matter. 20 (2008) 264016. [16] Y. Zhang, S. Ramanathan, Solid-State Electron. 62 (2011) 161–164.